| 摘要 |
PROBLEM TO BE SOLVED: To reduce the chip rotation of plural shot regions to be exposed on a substrate to an ignorable level. SOLUTION: This projection aligner is provided with a stage(WST) on which a substrate W is placed, and a fiducial plate(FP) arranged on the stage in which a fiducial mark(FM) is formed, and a positioning means 14 for aligning a mask by using the fiducial mark, so that the substrate can be exposed by projecting the pattern of the mask to the substrate. In this case, the projecting means aligns the mask based on the mounting error of the substrate on the stage.
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