发明名称 METHOD AND SYSTEM FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To solve the conventional problem, where the ratio of a constituent cannot be easily maintained at a specific value by excessively evaporating water being contained in treatment liquid, when the treatment liquid such as phosphoric acid aqueous solution is used at a temperature exceeding 100 deg.C under normal pressure. SOLUTION: When treatment liquid being composed of a plurality of liquid is used, pressure in a chamber is set larger than the normal pressure, while temperature is set lower than a boiling point under the normal pressure of the treatment liquid, and at the same time, is higher than the boiling point under the normal pressure of boiling point minimum liquid with the lowest boiling point under the normal pressure in the plurality of liquid for composing the treatment liquid, thus suppressing evaporation of water in the treatment liquid by setting the pressure in the chamber higher than the normal pressure.
申请公布号 JP2001102344(A) 申请公布日期 2001.04.13
申请号 JP19990279746 申请日期 1999.09.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MURAKAMI SHIGEKAZU
分类号 B08B3/04;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 主分类号 B08B3/04
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