发明名称 SUBSTRATE TREATING SYSTEM
摘要 PROBLEM TO BE SOLVED: To enable a substrate treating system to be higher lessened in exclusive area than the conventional substrate treating systems which are provided with two tanks, one is a multi-functional tank where pure water and chemicals which are both kept at a temperature of 100 deg.C or below under a normal temperature are alternately substituted with each other, and the other is an exclusive chemical tank where chemicals are kept at a higher temperature than 100 deg.C. SOLUTION: Pure water and chemicals kept at 100 deg.C or higher are alternately supplied to a treating tank, the treating tank is housed in a chamber, and the inner pressure of the chamber is so regulated as to make the boiling point of pure water higher than the temperature of the chemicals, by which the chemicals can be substituted with pure water.
申请公布号 JP2001102349(A) 申请公布日期 2001.04.13
申请号 JP19990279748 申请日期 1999.09.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MURAKAMI SHIGEKAZU
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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