发明名称 FACILITY OPERATION RATE MONITOR
摘要 <p>PROBLEM TO BE SOLVED: To dispense with an interface by detecting various signals without making electrical connections with production facilities. SOLUTION: A facility operation rate monitor 61 is composed of a detecting sensor part and a main body 13 of operation rate monitor. The detecting sensor part is composed of a sensor part 12a, an amplifier part 12b and a waveform shaping part 12c. The sensor part 12a is composed of various sensors, such as photosensor like photodiode and sound sensor like microphone and attached to the lamp or buzzer of a signal tower ST provided in each of production facilities 71, detects various signals and outputs them to the main body 13 of operation rate monitor as operation data. Thus, the facility operation rate monitor 61 can be easily attached to the production facility 71 in a short time.</p>
申请公布号 JP2001100820(A) 申请公布日期 2001.04.13
申请号 JP19990275531 申请日期 1999.09.29
申请人 HITACHI HOKKAI SEMICONDUCTOR LTD 发明人 OIDE TAKU;HIRAI MUTSUO;YAGISAWA TORU;NASUKAWA SATORU
分类号 G05B19/18;B23Q41/08;G05B19/4063;G05B19/418;G06F17/40;G06Q50/00;G06Q50/04;(IPC1-7):G05B19/18;G06F17/60;G05B19/406 主分类号 G05B19/18
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