发明名称 PLASMA TREATMENT APPARATUS AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus that may prevent electric field concentration, arc, destruction of the protective layer, thermal destruction, and irregular discharge, and improve the durability of the protective layer. SOLUTION: A pair of electrodes 2 and 3 is arranged in a chamber 1. A plasma generation gas is introduced into the chamber 1. Supplied between the electrodes 2 and 3 is an electric field of alternate or pulse current to generate a dielectric barrier discharge under about an atmospheric pressure. The dielectric barrier discharge generates plasma from the plasma generation gas to treat an object with the plasma. The surface of the electrodes 2 and 3 is coated with a protective layer of a glass material formed by heat fusion, whose pin hole is extremely small to protect the electrodes 2 and 3.
申请公布号 JP2001102199(A) 申请公布日期 2001.04.13
申请号 JP20000155549 申请日期 2000.05.26
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 NAKAMURA KOSUKE;KITAMURA KEIMEI;SAWADA KOJI
分类号 H05H1/24;B01J19/08;C23C16/509;C23C16/515;H01L21/027;H01L21/205;H01L21/302;H01L21/3065;H05H1/46 主分类号 H05H1/24
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