| 摘要 |
PROBLEM TO BE SOLVED: To easily form a pattern of nanometer to micron order having appreciable regularity by utilizing the phase separation of a blended polymer. SOLUTION: The micropattern is formed through a step for forming a thin film of a micropattern forming material comprising a polymer blend containing two or more polymers on a base, a step for forming a phase separated structure fixed in the formation and growth of nuclei in the thin film, a step for breaking the principal chain of at least one of the polymers by irradiating the thin film with high energy beams, a step for selectively removing the phase of the polymer with the broken principal chain and a step for patterning the base through the phase of the remaining polymer as a mask. |
