| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device in which the luminous intensity of an exposed face is sufficiently high even when a horizontal size of virtual image of a light source is greatly different from a vertical size of virtual image of a light source, and which is capable of reducing an exposure time. SOLUTION: An exposure device 1 comprises a lighting means 4 having an optical integrator 5 for receiving light through a condensing reflection member 3 at one end thereof, integrate the light, to project the light from the other end, and a projection lens 6 for projecting a light flux projected by the lighting means 4 to the all area of an exposed face. In a virtual image region of the projection lens 6, a pseudo refraction characteristic point V corresponding to a vertical deflection property and a pseudo refraction characteristic point H corresponding to a horizontal deflection property at the actual image projection corresponds to an actual vertical deflection point and a horizontal deflection point, respectively, thereby creating a gap S. The expose device 1 has also astigmatism with the gap S and means 11 for varying a spread angle of an incident ray disposed prior to an incident part of the optical integrator 5. The means 11 comprises a plurality of condensing lens 11a or a single anamorphotic lens.
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