| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a positive type radiation sensitive composition having high sensitivity and such resolution as to attain sub-quarter-micron patterning. SOLUTION: The positive type radiation sensitive composition contains a polymer containing a structural unit of formula 1 and an acid generating agent which generates an acid when irradiated. In the formula 1, X is halogen or cyano and R is an acid decomposable organic group containing at least one structure of formula 2 (where R1 and R2 are each alkyl, aryl, arylalkyl, alkoxyalkyl, alkoxyaryl, alkoxyarylalkyl, hydroxyalkyl, hydroxyaryl, hydroxyarylalkyl or the like, R1 and R2 may form a ring structure by ring closure, R3 is a 1-12C organic group and (m) is 0 or 1).</p> |
