EXPOSURE MASK ETCHING METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To enable a mask etching process to be carried out at a lower cost by a method, where a heat distribution and a membrane mask are each enhanced in controllability and dimensional controllability respectively in a membrane mask etching process. SOLUTION: The distance between a heat sink 6 arranged close to the rear of a membrane 2 and the membrane 2 is made to range, so as to relax the distribution of a pattern dimensional change on an etching plane in a process where a membrane is etched. The heat sink 6, made to approach the rear of the membrane 2, is divided into several parts, and each part of the heat sink 6 is set at an optimal temperature so as to relax distribution of a pattern dimensional change on an etching plane. At least one or more mounting holes for mounting the heat sink 6 are provided to an membrane mask etching cassette.