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发明名称
Thermomechanisches Verfahren zum Planarisieren einer fototechnisch strukturierbaren Schicht, insbesondere Verkapselung für elektronische Bauelemente
摘要
申请公布号
DE19820049(C2)
申请公布日期
2001.04.12
申请号
DE19981020049
申请日期
1998.05.05
申请人
EPCOS AG
发明人
FUERBACHER, BRUNO
分类号
G03F7/004;G03F7/38;H01L21/027;H01L21/56;H03H3/08;H03H9/05;(IPC1-7):G03F7/00;H03H9/10;H03H9/25;H05K3/28
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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