METHOD FOR MAKING A RIDGE WAVEGUIDE SEMICONDUCTOR DEVICE

摘要

An electro-optical device including a ridge waveguide with at least one overhanging sidewall has polyimide filling in the region under the overhanging sidewall to facilitate the deposition of a continuous metal ridge-contact layer. The polyimide is deposited surrounding the ridge waveguide and etched using directed reactive ion etching at low pressure and high temperature leaving polyimide filling in the region under the overhanging sidewall.