| 摘要 |
<p>The present invention provides for a method and an apparatus for monitoring controller performance using statistical process control analysis. A manufacturing model (140) is defined. A processing run of semiconductor devices is performed as defined by the manufacturing model (140) and implemented by a process controller (610). A fault detection analysis is performed on the process controller (610). At least one control input signal generated by the process controller (610) is updated. The apparatus of the present invention comprises: a processing controller (610); a processing tool (620) coupled with the processing controller (610); a metrology tool (630) interfaced with the processing tool (620); a control modification data calculaton unit (640) interfaced with the metrology and connected to the processing controller (610) in a feedback manner; a predictor function (650) interfaced with the processing controller (610); a statistical process control analysis unit (660) interfaced with the predictor function (650) and the processing tool (620); and a results versus prediction analysis unit (670) interfaced with the statistical process control analysis unit (660) and connected to the processing controller (610) in a feedback manner.</p> |
