| 摘要 |
<p>There is provided an ArF excimer laser device for performing an oscillating operation with a repetition rate of more than 3 kHz and an oscillating laser pulse width Tis of more than 30 ns. The laser operation is carried out in a start half-period of an electrical discharge oscillating current waveform of a pulse of reversed polarity generated by a high voltage pulse generating device and in at least two subsequent half-periods. The pressure of the laser gas in the laser chamber is 2.5 to 3.5 atm, the fluorine concentration is 0.12% or less, and the argon gas concentration 3% or less. As a result, the laser pulse width Tis can be set to more than 30 ns. <IMAGE></p> |
