发明名称 |
Method for the production of a micromechanical semiconductor array |
摘要 |
<p>The invention relates to a micromechanical semiconductor array comprising a membrane (7) formed inside a hollow space (9). The membrane (7) is configured by a crystalline layer inside the substrate (1) or inside an epitaxial layer sequence of the semiconductor array placed inside a substrate (1). The membrane (1) is placed on the edge segment on a support (6) and covered by a covering layer (4) held on a counter-support (5). The support (6), the counter-support (5) and the membrane are all made of materials with different etching rates in relation to a predetermined wet-chemical etching agent and preferably consist of materials with different doping.</p> |
申请公布号 |
EP0950190(B1) |
申请公布日期 |
2001.04.11 |
申请号 |
EP19980905214 |
申请日期 |
1998.01.05 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
MUELLER, KARLHEINZ;KOLB, STEFAN |
分类号 |
G01P15/125;B81B3/00;B81C1/00;G01P15/08;H01L21/306;(IPC1-7):G01P15/08 |
主分类号 |
G01P15/125 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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