Laser apparatus, exposure apparatus, lithography system, method for producing circuit elements, gas supply system and gas supply method

摘要

A laser apparatus comprises a plurality of laser beam sources which use, as laser media, mixed gases containing at least one common gas component; at least one common gas supply source for supplying, to the respective laser beam sources, the common gas component for constituting the mixed gases; and one or more gas flow amount-adjusting units for adjusting flow amounts of the common gas component supplied from the common gas supply source and other gas components for constituting the mixed gases so that the gas components are supplied to the respective gas laser beam sources. It is unnecessary to provide gas tanks for each of the laser beam sources. The arrangement of the gas supply equipment is simplified, and the safety is improved. A plurality of the laser apparatuses are preferably installed to a circuit element production line provided with a plurality of exposure apparatuses.