发明名称 HIGH ACCURACY BEAM BLANKER
摘要 The accuracy of a double-deflection beam blanker is dramatically improved for all blanker voltages by using provided, closed-form, trajectory equations to determine the blanker geometric parameters and compensating for fringe-field affects in order to precisely determine the delay line length for control of an electron or ion beam. This delay line length is maintained by placing alignment apertures above and below the blanker.
申请公布号 CA2069767(C) 申请公布日期 2001.04.10
申请号 CA19922069767 申请日期 1992.05.28
申请人 发明人 GESLEY, MARK
分类号 H01J9/44;H01J37/04;H01J37/305;H01L21/027;H01L21/30;(IPC1-7):H01L21/027;H01J3/26 主分类号 H01J9/44
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