发明名称 Grinding technique for integrated circuits
摘要 An integrated circuit die and method of fabricating the same. The method comprises further grinding, polishing or otherwise treating one or more perimeter edges of an individual circuit die. The perimeter edges are treated to remove a substantial portion of the remaining substrate material layer or scribe therefrom without exposing the active circuitry of the die. The process reduces the overall length and width dimensions of a die producing a smaller circuit die without reducing the amount of circuitry on the die.
申请公布号 US6215172(B1) 申请公布日期 2001.04.10
申请号 US19980137521 申请日期 1998.08.20
申请人 MICRON TECHNOLOGY, INC. 发明人 SCHOENFELD AARON
分类号 H01L21/301;H01L29/06;(IPC1-7):H01L29/06;H01L23/544;H01L21/46;H01L21/78 主分类号 H01L21/301
代理机构 代理人
主权项
地址