| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for stably manufacturing a Mg-containing ITO sputtering target and an evaporation material while preventing cracking during manufacture without causing reduction in yield. SOLUTION: The Mg-containing ITO sputtering target and evaporation material, consisting essentially of In, Sn, Mg and O, can be manufactured by mixing an indium oxide powder and a tin oxide powder or an indium oxide - tin oxide powder with a magnesium hydroxide powder, compacting and sintering the resultant powder mixture, and fabricating the resultant sintered compact. |
