发明名称 Electrostatic device for supporting wafers and other components for use at temperatures of up to 230° C.
摘要 An electrostatic chuck for clamping an electrically conducting workpiece includes an electrode that is incorporated between two insulating layers of an organic material, preferably polyimide, and that is mounted, with or without a coating, on a metallic pedestal. An insulating intermediate layer, for example, in the form of an intermediate ring having a thickness equal to or up to 10% greater than the thickness of the electrode, provided for eliminating a gap at the edge of the electrostatic chuck.
申请公布号 US6215641(B1) 申请公布日期 2001.04.10
申请号 US19990262611 申请日期 1999.03.04
申请人 VENTEC GESELLSCHAFT FüR VENTUREKAPITAL UND UNTERNEHMENSBERATUNG 发明人 BUSSE KARL-HERMANN;ARIT JOACHIM
分类号 H01L21/683;(IPC1-7):H02N13/00 主分类号 H01L21/683
代理机构 代理人
主权项
地址