| 摘要 |
PROBLEM TO BE SOLVED: To provide a rice polishing/washing apparatus which can remove an oxidized layer generated on the surface of polished rice, bran adherent to the surface, and bran caught in grooves without roughening the surface of rice. SOLUTION: An apparatus has a rice polishing chamber 14, a rice charging port 13, rice polishing plates 15, 16 having embedded brushes 17, a rice polishing plate cover 19 which surrounds the plate 15, 16 to prevent the scattering of rice outside the plates 15, 16, a rice polishing plate driving means 18 for driving the plates 15, 16, a rice polishing chamber cover 20 for preventing the scattering of rice outside the chamber 14, a polished rice discharging opening 21, a polished rice passage communicating with the port 13 from the opening 21, and a polished rice sending means 22 for sending rice from the opening 21 to the port 13. The port 13 and the opening 21 communicate with each other through the chamber 14, the brush tips of a pair of the rice polishing plates 15, 16 are made to face and approach each other, the plates 15, 16 are placed in the chamber 14, and numbers of holes are bored in the cover 19.
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