发明名称 High power gas discharge laser with line narrowing unit
摘要 A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating. In preferred embodiments a stream of gas is directed across the face of the grating. In other embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas and in other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
申请公布号 AU7112500(A) 申请公布日期 2001.04.10
申请号 AU20000071125 申请日期 2000.08.31
申请人 CYMER, INC. 发明人 RAYMOND F. CYBULSKI;ALEXANDER I. ERSHOV;ECKEHARD D. ONKELS;PALASH P DAS;DANILO D. RICHARDSON;JESSE D. BUCK
分类号 H01S3/225;G03F7/20;H01S3/03;H01S3/034;H01S3/036;H01S3/04;H01S3/08;H01S3/081;H01S3/086;H01S3/13;H01S3/134;H01S3/137;H01S3/139 主分类号 H01S3/225
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