发明名称 METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS INGOT
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for producing a synthetic quartz glass ingot by which the yield is not decreased even if the amount of fed raw material is increased to improve the volume of the production. SOLUTION: This method for producing the synthetic quartz glass ingot by supplying a silicon compound gas together with oxygen gas as a carrier to a quartz glass burner to jet from the center nozzle, accumulating silica particles formed by the gas-phase hydrolysis by oxyhydrogen flame on a target, and melting the accumulated silica particles to form a molten glass, is carried out by regulating the flow velocity of a mixed gas of the silicon compound gas with the oxygen gas as the carrier, gushed from the center nozzle of the quartz glass burner so as to be 20-40 m/s, and the molar ratio of the silicon compound gas to the oxygen gas as the carrier gas so as to be (1:1)-(1:2).</p>
申请公布号 JP2001097723(A) 申请公布日期 2001.04.10
申请号 JP19990278978 申请日期 1999.09.30
申请人 TOKUYAMA TOSHIBA CERAMICS CO LTD 发明人 KASHIWABARA MASAMITSU;SHIRAISHI KOICHI
分类号 C03B8/04;C03B19/14;C03B20/00;F23D14/38;(IPC1-7):C03B8/04 主分类号 C03B8/04
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