发明名称 |
METHOD FOR FORMING FLATTENED FILM, CERAMIC SUBSTRATE, AND ELECTRONIC COMPONENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for forming a flattened film of uniform thickness on a ceramic substrate with recesses on its surface so as to hard to cause cracking of the film and be capable of sufficiently flattening the recesses. SOLUTION: This method comprises the following steps: step 1 wherein a 1st flattening solution is applied on a ceramic substrate so as to fill recesses on the substrate therewith and to form a 1st flattened film, step 2 wherein the 1st flattened film is removed by a portion corresponding to a specified film thickness while leaving the film in the recesses, and step 3 wherein a 2nd flattening solution is applied on the 1st flattened film to form a 2nd flattened film.</p> |
申请公布号 |
JP2001097787(A) |
申请公布日期 |
2001.04.10 |
申请号 |
JP19990281238 |
申请日期 |
1999.10.01 |
申请人 |
MURATA MFG CO LTD |
发明人 |
YOSHIDA KOJI |
分类号 |
C04B41/52;C04B41/81;C04B41/89;H01G13/00;(IPC1-7):C04B41/81 |
主分类号 |
C04B41/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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