ULTRAVIOLET-CURING PHOTOSENSITIVE RESIN COMPOSITION FOR SHADOW MASK

摘要

PURPOSE: A UV curing resin photosensitive composition obtained by synthesizing a photopolymerizing oligomer and mixing a photopolymerizable monomer, a light initiator, a levelling agent and a defoaming agent is provided which little irritates the skin and is favorable in manufacturing a shadow mask by producing little harmful effects on the human body and can prevent sticking of resin vapor to a coating apparatus. CONSTITUTION: This UV curing photosensitive resin composition comprises a photopolymerizing oligomer having a skin irritation index (PI value) of less than 1.0 and one or more carboxyl groups and one acryloyl or methacryloyl group in a molecular; a reactive monomer having a skin irritation index (PI value) of less than 1.0 and one acryloyl or methacryloyl group in a molecular; a light initiator; a levelling agent; and a defoaming agent.