FABRICATION APPARATUS FOR SEMICONDUCTOR DEVICE

摘要

PURPOSE: An apparatus capable of depositing a metal and etching the deposited metal in a plasma manner is provided to attain more reliable cleaning and preliminary depositing processes and thereby to prevent any undesirable defects due to particles. CONSTITUTION: The apparatus is on standby during an intermediate interval of time between consecutive fabricating processes for a semiconductor device. When a signal informing the start(22) of the next process is inputted into the apparatus in a standby state(21), the apparatus counts a standby time(23). Then, the apparatus sequentially performs the cleaning process(24) and the preliminary depositing process(25) during an appropriate time according to the counted standby time. After the preliminary depositing process(25) is complete, a wafer is loaded into a chamber of the apparatus(26) and then a regular depositing process is carried out(27).