| 摘要 |
PURPOSE: An aligner for a resist process is provided to improve productivity by dividing a light source into two light sources by using a hologram and a holography so that an exposure process is simultaneously performed regarding two wafers on a multistage. CONSTITUTION: A holography unit(20) writes a reduced and projected light source, and divides the written image into first and second light sources for regeneration. A wafer(60) to be patterned is placed on the first and second stages(40,42). The first and second division lenses(30,32) apply the regenerated first and second light sources to the wafer placed on the respective stages.
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