| 摘要 |
PROBLEM TO BE SOLVED: To avoid local ununiformity of a pattern shape which is caused by the insufficient mixture of water and organic washing solution, when a water-soluble resist film is developed and washed to be patterned, and the developer (water) is washed off in the manufacturing process of a semiconductor device and causes the defective image of a solid-state image pickup device. SOLUTION: In a washing process, developer (water) is substituted by the mixture of organic washing solution and water, then the organic washing solution is supplied, and the mixture is substituted by the organic washing solution. Or, the concentration of the organic washing solution in the mixture may be gradually increased, while the mixture is supplied. The developer, the mixture, etc., are spouted out in a direction perpendicular to the surface of an acrylic system photoresist film from a nozzle 13 which moves reciprocally above the surface in a prescribed direction 10.
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