发明名称 CIRCUIT FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a circuit forming method by which excellent workability and excellent uniformity of a metal film can be obtained. SOLUTION: A photosensitive resin composition layer is formed on a board and exposed and developed to form a resist pattern and, after metal powder is sprayed upon the recessed parts of the resist pattern by high pressure gas to form a metal film, the cured resist layer is removed to form a circuit. Or, a photosensitive resin composition layer is formed on a board and exposed and developed to form a resist pattern and, after metal powder is sprayed upon the recessed parts of the resist pattern by high pressure gas to form a metal film, the cured resist layer is removed, the part from which the resist layer is removed is etched and then the metal film is removed to form a circuit. Or, a photosensitive resin composition layer is formed on a board and exposed and developed to form a resist pattern and, after metal plating is applied to the recessed parts of the resist pattern and metal powder is sprayed upon the recessed parts of the resist pattern by high pressure gas to form a metal film, the cured resist layer is removed, the part from which the resist layer is removed is etched and then the metal film is removed to form a circuit.
申请公布号 JP2001094235(A) 申请公布日期 2001.04.06
申请号 JP19990266412 申请日期 1999.09.21
申请人 NIPPON SYNTHETIC CHEM IND CO LTD:THE;FUJI SEISAKUSHO:KK 发明人 SATO HIROAKI;KANDA SHINJI
分类号 H05K3/06;C23C24/02;C23C24/04;H05K3/10;(IPC1-7):H05K3/10 主分类号 H05K3/06
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