发明名称 MASK FOR FORMATION OF ELECTRODE PATTERN AND PRODUCTION OF ELECTRO-OPTIC DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain an electro-optic device having an electrode pattern having an electrode the end of which is disposed in a driving region, and to provide a production method of the device so that when the electrode pattern is misaligned to the counter electrode pattern, the area of the pixel region is hardly increased or decreased and production of display defects can be reduced. SOLUTION: A photosensitive resist layer 28 (not shown in the figure) formed on a transparent conductive film 17 is exposed by using a light-shielding mask 29 and developed to form a resist pattern 28a. Then, the film is etched by using a mixture etching liquid such as sulfuric acid, nitric acid and hydrochloric acid. The opening 29a of the light-shielding mask 29 is formed a size larger than the planar form of the designed segment electrode 11a, 11b, and in the region corresponding to the corners 11a-2, 11b-2, the opening is formed as more expanded outward from the position corresponding to the outer edge of the segment electrode 11a, 11b than in other positions.
申请公布号 JP2001092382(A) 申请公布日期 2001.04.06
申请号 JP19990266003 申请日期 1999.09.20
申请人 SEIKO EPSON CORP 发明人 NAKAMURA TAKESHI
分类号 G09F9/30;G02F1/1343;(IPC1-7):G09F9/30;G02F1/134 主分类号 G09F9/30
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