发明名称 NEGATIVE TYPE RESIST COMPOSITION
摘要 PURPOSE: A negative type resist composition is provided to exhibit excellent pattern shape having low dependency of pattern size on post-exposure baking temperature and excellent sensitivity and resolution. CONSTITUTION: A negative type resist composition contains an alkali-soluble resin, an acid generating agent, a crosslinking agent and a basic compound of formula I wherein A is a divalent aliphatic hydrocarbon residue which may be interrupted by imino, a sulfide group or a disulfide group, X is N or C(NH2), and R1 and R2 are each H or alkyl.
申请公布号 KR20010029667(A) 申请公布日期 2001.04.06
申请号 KR20000022512 申请日期 2000.04.27
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 KUSUMOTO TAKEHIRO;SHINADA MASANORI;SUETSUGU MASUMI;TAKEYAMA NAOKI
分类号 G03F7/32;C08F8/30;C08F12/26;C08F293/00;C08F297/02;C08L53/00;G03F7/004;G03F7/038;(IPC1-7):G03F7/32 主分类号 G03F7/32
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