发明名称 |
NEGATIVE TYPE RESIST COMPOSITION |
摘要 |
PURPOSE: A negative type resist composition is provided to exhibit excellent pattern shape having low dependency of pattern size on post-exposure baking temperature and excellent sensitivity and resolution. CONSTITUTION: A negative type resist composition contains an alkali-soluble resin, an acid generating agent, a crosslinking agent and a basic compound of formula I wherein A is a divalent aliphatic hydrocarbon residue which may be interrupted by imino, a sulfide group or a disulfide group, X is N or C(NH2), and R1 and R2 are each H or alkyl.
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申请公布号 |
KR20010029667(A) |
申请公布日期 |
2001.04.06 |
申请号 |
KR20000022512 |
申请日期 |
2000.04.27 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
KUSUMOTO TAKEHIRO;SHINADA MASANORI;SUETSUGU MASUMI;TAKEYAMA NAOKI |
分类号 |
G03F7/32;C08F8/30;C08F12/26;C08F293/00;C08F297/02;C08L53/00;G03F7/004;G03F7/038;(IPC1-7):G03F7/32 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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