EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR DEVICE USING MULTI-ELECTRODE

摘要

PURPOSE: An equipment for manufacturing a semiconductor device using a multi-electrode is provided to improve process uniformity and easily control a profile, by increasing plasma uniformity while preventing plasma damage. CONSTITUTION: A predetermined process for manufacturing a semiconductor device is performed in a process chamber(30). A storage electrode(36) is installed in a lower portion of the inside of the process chamber, composed of a plurality of electrodes and connected to the plurality of the first attenuators supplied with the single first power source to supply impedance-matched power. A plate electrode(34) is installed in an upper portion of the inside of the process chamber, composed of a plurality of electrode and connected to the plurality of the second attenuators supplied with the single second power source to supply impedance-matched power.