| 摘要 |
PURPOSE: A wafer boat is provided to increase number of wafer loaded at a time by optimizing an interval of wafer slot pitch of the wafer boat. CONSTITUTION: A wafer boat(50) mounted on a low pressure chemical vapor deposition equipment comprises a top plate, a thermo-chamber and a number of support loads(53). The top plate, the thermo-chamber and the support loads(53) are made of quartz materials. The top plate has a circle shape the same size as the size of the plane of a wafer. The thermo-chamber having cylindrical shape is formed on a place away from the top plate at an interval. The support loads(53) are formed on the thermo-chamber in a semicircular shape. A number of slots each consisting of two wafer loaded parts(53a, 53b) are formed on inner surface of each support loads(53) so as to a number of wafers are loaded safely. The wafer loaded parts(53a,53b) have a wafer slot pitch by which the number of wafer loaded on the wafer boat is decided. The wafer slot pitch is decided by a thickness of a wafer loaded part(53a or 53b) and a width between two wafer loaded part(53a,53b). The wafer slot pitch becomes 3.56mm, when setting the thickness to 1.36mm and the width to 2.2mm.
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