| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an aligner and a method for making image of a mask pattern on a substrate with a resolution higher than that possessed by an optical system, using a white and black mask. SOLUTION: An aligner includes an aligner made up of an Hg lamp 3101, a condense lens 3103, an integrator 3104, a light source space filter 3301 as an annular imaginary light source formed by arranging a plurality of spot light sources a condenser lens 3106, a focus lens (reduction projection lens) 3201, a focus space filter (pupil) 3302 put near to the focus lens, a mask stage 3401, and a wafer stage 3402, a pattern generating system 1000, and a mask forming system 2000. In this case, by blinding all or part of a zero-th order diffraction light beam from a mask illuminated in annular form by an annular lighting means, there is an effect equal to a phase shifter method of a phase film formed on a mask pattern, so that the contrast of the focus pattern can be improved.</p> |
