发明名称 SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To realize fine patterning and reduction of ON resistance in an MOSFET for high frequency amplification having a drain offset region. SOLUTION: Conductor plugs 13(P1) for leading out electrode are provided on a source region 10, a drain region 9 and a reach through layer 3(4). The conductor plugs 13(P1) are connected, respectively, with first layer interconnections 11s, 11d(M1) which are connected, on the conductor plugs 13(P1), with second layer interconnections 12s, 12d for lining.
申请公布号 JP2001094094(A) 申请公布日期 2001.04.06
申请号 JP19990266668 申请日期 1999.09.21
申请人 HITACHI LTD 发明人 HOSHINO YUTAKA;IKEDA SHUJI;YOSHIDA ISAO;KANBARA SHIRO;KAWAKAMI MEGUMI;MIYAKE TOMOYUKI;MORIKAWA MASATOSHI
分类号 H01L29/78;H01L21/336;H01L21/8234;H01L23/482;H01L23/532;H01L27/04;H01L27/088;H01L29/417;(IPC1-7):H01L29/78;H01L21/823 主分类号 H01L29/78
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