SYSTEM FOR DEPOSITING THIN FILM

摘要

PURPOSE: A system for depositing a thin film is provided to improve work efficiency, by downloading a process condition of equipment so that a belt speed of the process equipment as a factor for determining a thickness of a layer is automatically controlled. CONSTITUTION: A process equipment(16) evaporates a thin film while transferring a wafer to a transfer unit inside. A measurement system(20) samples the wafer having the thin film by a predetermined lot unit. A boron phosphorous silicate glass(BPSG) server(12) collects data necessary for a thin film evaporation process, and controls the thickness of the thin film by controlling a speed of a transfer unit for transferring the wafer in the process equipment by a wafer transfer speed, a thickness of the thin film measured in the measurement system and a previously-established reference thickness. The BPSG server establishes a process condition including a speed of a belt to control for adjusting the thickness of the thin film. An equipment interface system(18) downloads the process condition established in the BPSG server to the process equipment.