发明名称 PHOTOSENSITIVE COMPOSITION FOR INFRARED LASER
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition for IR laser for direct plate making having a stable state before development, excellent in handleability and chemical resistance and excellent also in the solubility of the exposed part in an alkali developing solution. SOLUTION: The photosensitive composition contains (a) a material which absorbs light and generates heat and (b) a resin soluble in an alkaline aqueous solution and having a structural unit of formula 1, wherein A is H, a halogen or a 1-4C alkyl and R is a 1-6C alkyl, a 1-6C alkoxy or halogen. Preferably the composition further contains (c) a resin soluble in the alkaline aqueous solution and having a phenolic hydroxyl group.
申请公布号 JP2001092120(A) 申请公布日期 2001.04.06
申请号 JP19990265254 申请日期 1999.09.20
申请人 FUJI PHOTO FILM CO LTD 发明人 KAWACHI IKUO
分类号 G03F7/004;C08L33/24;C08L61/06;G03F7/00;G03F7/027;G03F7/038;G03F7/20 主分类号 G03F7/004
代理机构 代理人
主权项
地址