PREPARATION OF PHENOLIC COMPOUND HAVING PROTECTED HYDROXY GROUP

摘要

PROBLEM TO BE SOLVED: To provide a resin suitable for use in the formation of a radiation sensitive composition excellent in sensitivity in photolithography using far IR. SOLUTION: When a phenolic compound is reacted with an enol ether in the presence of an acid catalyst to prepare the objective phenolic compound having a protected hydroxy group, a hydrogen halide which is gaseous at ordinary temperature and pressure is used as the acid catalyst.