COMPOSITION OF RESIST STRIPPING AGENT, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a resist stripping agent compound with satisfactory characteristics in exfoliating a remainder of resist generated by etching or ashing under severe conditions. SOLUTION: A resist striping agent compound comprises an amine compound and at least one kind of aldehyde compound chosen from formaldehyde, paraformaldehyde, acetaldehyde, para-aldehyde group, and a chelate agent.