发明名称 CLEANING MACHINE
摘要 PROBLEM TO BE SOLVED: To reduce cleaning work and prevent spattering of a chemical or damages of a tank. SOLUTION: A drain-board 7 is floated in a washing tank 2 containing a chemical agent 6. When a jig 5 on which semiconductor wafers 4 to be cleaned are disposed is placed on the drain-board 7, the drain-board 7 sinks by the weight of the jig 5 (including the semiconductor wafers). At this time, the drain- board 7 slowly sinks to the bottom of the cleaning tank 2 since the chemical agent 6 passes through a plurality of through-holes 8, 8, etc., provided in the drain-board 7 and gradually diffuses. Therefore, the worker does not need to sink the jig 5 slowly, so that the chemical agent 6 is not spattered and has only to place the jig 5 on the drainboard 7.
申请公布号 JP2001093870(A) 申请公布日期 2001.04.06
申请号 JP19990272460 申请日期 1999.09.27
申请人 SONY CORP 发明人 IMAYOSHI MASAHIRO
分类号 B08B3/10;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/10
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