DRY-CLEANING APPARATUS AND METHOD USED IN MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: A dry-cleaning apparatus is provided to prevent a defect of a semiconductor device caused by polymer not completely eliminated, by effectively setting an interval of time taken for a dry-cleaning process according to the quantity of the polymer formed in a process chamber. CONSTITUTION: A gas supply unit(180) supplies gas into a process chamber(110). A radio frequency(RF) supplying unit(170) supplies RF power to an electrode installed inside the process chamber. A detecting unit detects impedance formed in the process chamber. A controller(200) controls operation of the gas supply unit and the RF power supplying unit, and stops the gas supply unit when the impedance inputted from the impedance detecting unit reaches a predetermined value.