| 摘要 |
<p>PURPOSE:To transfer all of plural patterns with high dimensional accuracy by eliminating an effect caused by coma aberration by forming a dummy pattern on both ends of the plural patterns. CONSTITUTION:The direction and the size of the optical system of an exposure device that the coma aberration is generated is measured in respective areas in a field and the direction of the composite vector thereof is defined as the average in-plane direction of the optical system that the coma aberration is generated. In the case that plural line patterns l1 - l5 are formed in directions B - B' within 45 deg. with respect to the average in-plane direction A - A' of the optical system of the exposure device that the coma aberration is generated, the dummy patterns ls and le are formed at both ends of the plural line patterns l1 - l5. Thus, the dimensional accuracy of all patterns which are transferred is improved.</p> |
