发明名称 |
METHOD FOR PRODUCING THIN LAYER OF DIAMOND LIKE CARBON |
摘要 |
PURPOSE: A method for producing diamond like carbon thin layer is provided which can produce very hard DLC(Diamond Like Carbon) thin layer compared to one produced by a conventional ECR-CVD(Electron Cyclotron Resonance-Chemical Vapor Deposition) apparatus with ease, and can reduce the degree of errors, by being able to expect the properties of resultant DLC thin layer through analysing the contents of plasma used in the vapor deposition reaction. CONSTITUTION: A method for producing thin layer of diamond like carbon(DLC), using an ECR-CVD apparatus(20) comprises: a gas inlet part(10); an ECR(21) chamber which makes the input gas plasma; a magnetic power generator(40) installed outer surface of the ECR chamber; a reaction chamber(22) which can be installed with a base panel to which vapor evaporation is performed by reaction particles, communicating with the ECR chamber; a pressure regulating means for the reaction chamber; a bias applying means which can apply electric bias; and a microwave generator(50) which applies microwave into the ECR chamber.The apparatus is characterized by feeding gas for manufacturing DLC thin layer into the ECR chamber with keeping a certain rate, and performing vapor deposition, keeping the pressure inside the reaction chamber more than 10 milli torr.
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申请公布号 |
KR20010026548(A) |
申请公布日期 |
2001.04.06 |
申请号 |
KR19990037906 |
申请日期 |
1999.09.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HAN, IN TAEK;HONG, SUN HYEONG;KIM, SEONG HUN;RYU, HO JIN |
分类号 |
C01B31/06;(IPC1-7):C01B31/06 |
主分类号 |
C01B31/06 |
代理机构 |
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