| 摘要 |
PROBLEM TO BE SOLVED: To provide a photopolymerizable composition having both high sensitivity and excellent shelf stability in a photo-radical polymerization system composition having the highest sensitivity on which a hopeful view is taken in image forming technique. SOLUTION: The photopolymerizable composition contains a compound having a structure of formula I and a photopolymerization initiator. In formula I, X1 and X2 are each a heteroatom or a halogen, Ra and Rb are each H, a halogen, cyano or an organic residue and X1 and X2, Ra and Rb, XI and Ra, or XI and Rb may bond to each other to form a cyclic structure. |
