PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE MATERIAL, PRODUCTION OF RELIEF PATTERN AND PRODUCTION OF POLYIMIDE PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition and a photosensitive material which exhibit excellent photosensitive characteristics and shelf stability and have high resolution and good process stability, and to produce a relief pattern and a polyimide pattern. SOLUTION: The photosensitive composition contains an α-(alkylthio) acrylonitrile of formula I, a titanocene compound of formula II and an addition polymerizable compound. The photosensitive material contains an α-(alkylthio) acrylonitrile of formula I, a titanocene compound of formula II and a polyimide precursor having a carbon-carbon double bond capable of dimerization or polymerization under actinic rays. A coating of the photosensitive composition or the photosensitive material is patternwise irradiated with active rays and the unirradiated part is removed by development.