发明名称 METHOD AND DEVICE FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To decrease the footprints of a treating device which continuously executes plural treating stages. SOLUTION: This device is provided with plural treating vessels (A1), (A2), (A3), (B1), (B2) and (B3) which accept substrates (1) therein and subject the substrates to various kinds of treatment. The treating vessels are dispersed to respective treating vessel groups (A) and (B) and are arrayed in three stages in such a manner that the continuous treatments are executed in the treating vessels of the opposite treating vessel groups (A) and (B). Transporting vessels (C) having transporting vessels (C1), (C2) and (C3) are parallel movably disposed between the treating vessel groups (A) and (B). The treating vessels and transporting vessel described above are internally provided with rollers (7),..., (11)... in such a manner that the substrates (1) are made to travel leftward or rightward. The substrates (1) taken out of a loader cassette (2) are alternately transported to the treating vessel group (A) and the treating vessel group (B), are subjected to various kinds of the treatments and are housed into an underloader cassette (3).
申请公布号 JP2001091917(A) 申请公布日期 2001.04.06
申请号 JP19990264264 申请日期 1999.09.17
申请人 ENYA SYSTEMS LTD 发明人 YOKOSUKA NORIYOSHI
分类号 G02F1/13;G02F1/1333;(IPC1-7):G02F1/13 主分类号 G02F1/13
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