| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for mask alignment and an exposure system using it, which enables the improvement in the manufacturing efficiency and the reduction of time for measuring a quantity of the discrepancy in position of reticles, when a plurality of reticles are subjected to the successive exposures. SOLUTION: This exposure system has the constitution, where after a first reticle R is positioned and its position is measured, for a second and the later reticles R, a quantity of the discrepancy in position is measured relative to the first reticle R, and the second and the later reticles are positioned in the position of the first reticle R based on the measured result. Also, for example, a plurality of groups of image processing devices 18a and 18b such as CCDs are used for the measurement of the second and the later reticles R.
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