HOLLOW APERTURE, METHOD OF FORMING THE SAME, CHARGED PARTICLE BEAM EXPOSURE SYSTEM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a hollow aperture with a fine aperture. SOLUTION: Protruding parts 12 with slopes 14 are formed in the center part of a 1st member 1. The tip parts of the protruding parts 12 consist of beams 13. A beam absorber 11 is supported by the beams 13 on both its sides. Circular arc shaped cut parts 21 are formed in the center parts of the tips of 2nd members 2. The radii of the circular arcs of the cut parts 21 are a slightly larger than the radius of the beam absorber 11. Slopes 22 for alignment are formed on the side parts of the tips of the 2nd members 2. The 2nd members 2 are connected to the 1st member via elastic parts 3 which are formed so as to be thin enough to be expandable/contractable. By pressing the 2nd members 2 against the 1st member 1 from both the sides, a doughnut-shaped hole with a fine width is formed between the beam absorber 11 and the cut parts 21, and the hole becomes a hollow aperture.