METHOD AND APPARATUS FOR POSITION MEASUREMENT

摘要

PROBLEM TO BE SOLVED: To provide a position measurement method and a position measurement apparatus which enable position detection with high accuracy without going through an actual process, even if WIS varies in a wafer. SOLUTION: A plurality of alignment marks with different line widths are prepared in a wafer. The plurality of alignment marks are detected with a plurality of focus positions at a plurality of points in the wafer. The alignment mark which has the least change in the focusing characteristics is selected.