SYSTEM FOR MEASURING FLATNESS OF MASK OF EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a system for measuring the flatness of mask which is capable of easily measuring the flatness of the mask of an exposure device of a proximity system with high accuracy and is excellent in versatility. SOLUTION: The system for measuring the flatness of the mask comprises plural contact type displacement sensors 21 which are freely attachably and detachably mounted at an exposure chuck 2, a sensor amplifier 22 which amplifies the signals from respective plural contact type displacement sensors 21 and a personal computer 23 which is inputted with the signals from the respective contact type displacement sensors 21 amplified by the sensor amplifier 22 and is previously installed with a program (sensor signal processing software, chart computing software, etc.), for converting and outputting these input signals to the information on the flatness of the mask 8.