LIGHT TRANSMITTANCE CONTROL RETICLE AND DEVELOPING METHOD FOR PHOTOSENSITIVE MATERIAL USING SAME

摘要

PURPOSE: A light transmittance control reticle capable of controlling light transmittance by inserting a light transmittance auxiliary pattern film having a specified light transmittance into between a mask disk and a chromium film and method for controlling the developing depth of photosensitivity fixing materials deposited on a semiconductor are provided which prevent cracks caused by stress in succeeding thermal processes. CONSTITUTION: In a reticle used for light transmittance by laminating a chromium film on the upper surface of a mask disk (10) and etching with photosensitive patterns, a light transmittance auxiliary pattern film (20) having a specified light transmittance is inserted into between the mask disk and the chromium film (30) to control light transmittance, wherein the light transmittance auxiliary pattern film has the formula: CrOxNy and a transmittance of 50 to 70%. Photosensitivity fixing materials (70) as polyimide are deposited on a semiconductor substrate and have a thickness of 7 to 12 micrometer.